PLASMA REACTOR WITH A DYNAMICALLY ADJUSTABLE PLASMA SOURCE POWER APPLICATOR

摘要

workpiece to a processing plasma reactor ceiling for the inclusion of the enclosure has a a process chamber having a generally vertical axis symmetry perpendicular to the ceiling, in general, facing the ceiling, and a vacuum pump connected to a process gas injector, and the chamber is connected to the workpiece support pedestal, the chamber is placed in the chamber The. The reactor is the overhead placed on the top of a radially inward supply base and the radially outer supply base plasma source power supply having a, the inner and outer feeder portions RF power device connected to, and at least supporting the outer supply base further it comprises a tilting device which can be tilted to at least the outer supply base around a radial axis perpendicular to and rotating at least the outer periphery of the supply base in a symmetry axis about the symmetry axis. The reactor may further comprise a rising (elevation) device for changing the position of the inner and outer supply base relative to each other along the vertical axis symmetry. In a preferred embodiment, the raising device comprises a lift actuator for raising and lowering the inner supply base along the vertical axis symmetry. ;