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Silica particles, the manufacturing method and semiconductor implementation for the paste

机译:二氧化硅颗粒,糊剂的制造方法和半导体实现

摘要

PROBLEM TO BE SOLVED: To provide silica particles which scarcely discharge α-rays, which is excellent in dispersibility to a resin, and which can be contained in a paste for semiconductor packaging.;SOLUTION: The silica particles have an average particle size of 10 nm to 10 μm measured by dynamic light scattering, wherein the ratio (U/SiO2) of mass of uranium to mass of silicon oxide (in terms of SiO2) is 2 ppb or less, the ratio (Th/SiO2) of mass of thorium to mass of silicon oxide (in terms of SiO2) is 2 ppb or less, and the ratio (alkali metal element/SiO2) of mass of alkali metal elements to mass of silicon oxide (in terms of SiO2) is 10 to 1,000 ppm.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供几乎不释放α射线,对树脂的分散性极佳并且可以包含在半导体封装用糊剂中的二氧化硅颗粒;解决方案:二氧化硅颗粒的平均粒径为10通过动态光散射法测量的nm到10μm,其中铀质量与氧化硅质量之比(U / SiO 2 )以SiO 2 为2 ppb以下,,的质量与氧化硅的质量之比(以SiO 2 计)(Th / SiO 2 )为2 ppb以下,并且碱金属元素质量与氧化硅质量(以SiO 2 表示)之比(碱金属元素/ SiO 2 )为10至1,000 ppm。 :(C)2013,JPO&INPIT

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