首页> 外国专利> HIGH-PURITY LANTHANUM, METHOD FOR PRODUCING SAME, SPUTTERING TARGET COMPRISING HIGH-PURITY LANTHANUM, AND METAL GATE FILM COMPRISING HIGH-PURITY LANTHANUM AS MAIN COMPONENT

HIGH-PURITY LANTHANUM, METHOD FOR PRODUCING SAME, SPUTTERING TARGET COMPRISING HIGH-PURITY LANTHANUM, AND METAL GATE FILM COMPRISING HIGH-PURITY LANTHANUM AS MAIN COMPONENT

机译:高纯镧,制造高纯镧的方法,溅射包括高纯镧的靶标以及以高纯镧为主要成分的金属栅膜

摘要

High-purity lanthanum characterized in that the purity, in terms of the purity of the lanthanum excluding any rare-earth elements and any gas components, is 5 N or higher and the number of α-ray counts is 0.001 cph/cm
机译:高纯度镧,其特征在于,以不包括稀土元素和气体成分的镧的纯度计,其纯度为5N以上,且α射线计数为0.001cph / cm。

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