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HIGH-PURITY LANTHANUM, METHOD FOR PRODUCING SAME, SPUTTERING TARGET COMPRISING HIGH-PURITY LANTHANUM, AND METAL GATE FILM COMPRISING HIGH-PURITY LANTHANUM AS MAIN COMPONENT
HIGH-PURITY LANTHANUM, METHOD FOR PRODUCING SAME, SPUTTERING TARGET COMPRISING HIGH-PURITY LANTHANUM, AND METAL GATE FILM COMPRISING HIGH-PURITY LANTHANUM AS MAIN COMPONENT
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机译:高纯镧,制造高纯镧的方法,溅射包括高纯镧的靶标以及以高纯镧为主要成分的金属栅膜
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摘要
High-purity lanthanum characterized in that the purity, in terms of the purity of the lanthanum excluding any rare-earth elements and any gas components, is 5 N or higher and the number of α-ray counts is 0.001 cph/cm
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