首页> 外国专利> MANUFACTURING METHOD OF CATALYST-FREE LOW-TEMPERATURE SUBSTRATE GROWN GRAPHENE, CATALYST-FREE LOW-TEMPERATURE SUBSTRATE GROWN GRAPHENE, AND MANUFACTURING APPARATUS OF CATALYST-FREE SUBSTRATE GROWN GRAPHENE

MANUFACTURING METHOD OF CATALYST-FREE LOW-TEMPERATURE SUBSTRATE GROWN GRAPHENE, CATALYST-FREE LOW-TEMPERATURE SUBSTRATE GROWN GRAPHENE, AND MANUFACTURING APPARATUS OF CATALYST-FREE SUBSTRATE GROWN GRAPHENE

机译:无催化剂的低温基质生长的石墨烯的制备方法,无催化剂的低温基质生长的石墨烯和无催化剂的基质生长的石墨烯的制造装置

摘要

Provided is a manufacturing method of catalyst-free low-temperature substrate grown graphene. More specifically, provided is a manufacturing method of catalyst-free low-temperature substrate grown graphene, comprising the following steps: (a) preparing a substrate on which a substrate layer is formed; (b) supplying carbon-containing gas at a temperature below 500C and conducting inductively coupled plasma-chemical vapor deposition (ICP-CVD); and (c) growing graphene on the substrate layer without comprising a catalyst layer.;COPYRIGHT KIPO 2016
机译:提供了一种无催化剂的低温底物生长石墨烯的制造方法。更具体地,提供了一种无催化剂的低温衬底生长的石墨烯的制造方法,包括以下步骤:(a)制备在其上形成衬底层的衬底; (b)供应温度低于500℃的含碳气体,并进行电感耦合等离子体化学气相沉积(ICP-CVD); (c)在不包含催化剂层的情况下在基底层上生长石墨烯。; COPYRIGHT KIPO 2016

著录项

  • 公开/公告号KR20160085418A

    专利类型

  • 公开/公告日2016-07-18

    原文格式PDF

  • 申请/专利权人 LEE YOUN TEK;

    申请/专利号KR20150002371

  • 发明设计人 LEE YOUN TEKKR;

    申请日2015-01-08

  • 分类号C01B31/04;

  • 国家 KR

  • 入库时间 2022-08-21 14:13:54

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