首页> 外国专利> Diode with a p-n junction, which has an adjustable heterostructure, self-positioning on HgCdTe, for imaging signal imaging in the infrared region of the spectrum

Diode with a p-n junction, which has an adjustable heterostructure, self-positioning on HgCdTe, for imaging signal imaging in the infrared region of the spectrum

机译:具有p-n结的二极管,具有可调整的异质结构,自定位在HgCdTe上,用于在光谱的红外区域对信号成像

摘要

1. A device having at least one heterostructured p / n diode containing an HgCdTe-based substrate, mainly n-doped, said substrate containing for each diode: a first part (4) having a first cadmium concentration, a second part ( 11) having a second cadmium concentration greater than the first cadmium concentration, the second part, or concentrated part (11), forming a heterostructure with the first part (4), p + doped zone (9) or p-doped zone located in concentrated part (11), continuing in ne the first part (4) and forming the p / n junction (10) with the n-doped portion of the first part (4), or the base substrate (1), in which the concentrated part (11) is located only in the p + doped zone (9 ) and form a pocket (12), essentially with a constant concentration of cadmium. 2. A device according to claim 1, wherein the pocket (12) has a base located at a substantially constant average distance (D) relative to the p / n junction (10). 3. The device according to claim 2, wherein when it contains at least two adjacent heterostructured p / n diodes, the pockets (12) of two adjacent diodes are separated, and the average relative distance (D) in one of the two diodes is substantially equal relative average distance (D) in another diode. 4. The device according to any one of paragraphs. 1-3, in which the p + doped zone (9) is doped with an acceptor dopant (8) .5. A device according to claim 4, wherein the acceptor dopant (8) is arsenic. A device according to claim 1, wherein the base substrate (1) is made of HgCdTe, where x has a value between 0.15 and 0.95, and describes a first cadmium concentration. The device according to claim 6, in which the pocket (12) is made of HgCdTe, where y has a value�
机译:1.一种具有至少一个异质结构的p / n二极管的器件,所述异质结构的p / n二极管包含主要为n掺杂的基于HgCdTe的衬底,所述衬底对于每个二极管包含:具有第一镉浓度的第一部分(4),第二部分(11)具有大于第一镉浓度,第二部分或浓缩部分(11)的第二镉浓度,并与第一部分(4),p +掺杂区(9)或p掺杂区位于浓缩区中形成异质结构(11),在第一部分(4)中连续并与第一部分(4)的n掺杂部分或基础衬底(1)形成p / n结(10),其中浓缩部分(11)仅位于p +掺杂区(9)中并形成基本上具有恒定浓度的镉的袋(12)。 2.根据权利要求1所述的装置,其中,所述凹穴(12)具有相对于所述p / n结(10)位于基本恒定的平均距离(D)处的底部。 3.根据权利要求2所述的装置,其中,当所述装置包含至少两个相邻的异质结构p / n二极管时,两个相邻的二极管的所述凹穴(12)是分开的,并且所述两个二极管之一中的平均相对距离(D)为另一个二极管的相对平均距离(D)基本相等。 4.根据任一段落的设备。参照图1-3,其中p +掺杂区(9)掺杂有受体掺杂剂(8).5。 5.根据权利要求4所述的装置,其中,所述受主掺杂剂(8)是砷。 2.根据权利要求1所述的器件,其中,所述基础衬底(1)由HgCdTe制成,其中,x的值在0.15至0.95之间,并且描述了第一镉浓度。 7.根据权利要求6所述的装置,其中,所述袋(12)由HgCdTe制成,其中y具有值。

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