Illumination optics as well as an imaging optical system for a metrology system for the investigation of an object with euv - lighting - and abstract light as well as metrology system with such an illumination optics or of such an optical imaging system

摘要

A metrology system (2) is used for the investigation of an object (5) with euv - lighting - and abstract light (1). An illumination optics (7) for the metrology system (2) has a in the beam path in front of the object (5) arranged lighting - aperture diaphragm (11) to the peripheral boundary of a bundle of the illumination light (1). The lighting - aperture diaphragm (11) has, in a diaphragm plane (xy) in two directions perpendicular to each other from each other by two different aperture diameter of at least 10%. An imaging optical system (13) has a in the beam path of the object (5) arranged imaging - aperture diaphragm (15) to the peripheral boundary of a bundle of the image light (1). The imaging - aperture diaphragm (15) has, in a diaphragm plane (xy) in two directions perpendicular to each other from each other by two different aperture diameter of at least 10% (bx, by). The result is a metrology system, the optics to the in the case of the anamorphic projection exposure for the production of semiconductor components present lighting - and imaging conditions are adapted to.