首页> 外国专利> MULTI-ELEMENT SIMULTANEOUS TYPE FLUORESCENT X-RAY ANALYZER AND MULTI-ELEMENT SIMULTANEOUS FLUORESCENT X-RAY ANALYSIS METHOD

MULTI-ELEMENT SIMULTANEOUS TYPE FLUORESCENT X-RAY ANALYZER AND MULTI-ELEMENT SIMULTANEOUS FLUORESCENT X-RAY ANALYSIS METHOD

机译:多元素同时型X射线分析仪及多元素同时型X射线分析方法

摘要

PROBLEM TO BE SOLVED: To provide a multi-element simultaneous type fluorescent X-ray analyzer, etc. that can precisely correct a background even if a notch part is formed at a sample table.SOLUTION: A multi-element simultaneous type fluorescent X-ray analyzer according to the invention comprises: a sample table 2 where a sample 1 is placed; a carrier arm 22 for the sample 1; a stage 11 that moves the sample table 2; and an X-ray source 8 that emits a primary X-ray 7. The sample table 2 has a notch part 2e formed for allowing the carrier arm 22 to pass through in a vertical direction. Background correction means 21 preliminarily stores intensity for each measurement point Pin a blank wafer 1b after subtracting measured intensity at a reference measurement point Pon the notch part 2e from measured intensity at the measurement point P, as background intensity at the measurement point P, and performs correction for each measurement point Pin an analysis object sample 1a after subtracting the background intensity at the measurement point Pfrom the measured intensity at the measurement point P.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种多元素同时型荧光X射线分析仪等,即使在样品台上形成凹口部分也能精确校正背景。解决方案:多元素同时型荧光X-射线分析仪等根据本发明的射线分析仪包括:样品台2,放置样品1;样本1的承载臂22;载物台11移动样品台2。样品台2具有形成为用于使搬运臂22在上下方向上通过的切口部2e,该X射线源8发出一次X射线7。背景校正单元21预先从缺口P 2的基准强度P减去缺口部2e处的基准强度P之后的空白强度后的空白强度,作为空白P 1的背景强度,存储在空白晶片1b中。每个测量点的校正从测量点P的测量强度中减去测量点P的背景强度后,将分析对象样品1a固定。图1

著录项

  • 公开/公告号JP2017161276A

    专利类型

  • 公开/公告日2017-09-14

    原文格式PDF

  • 申请/专利权人 RIGAKU CORP;

    申请/专利号JP2016044179

  • 发明设计人 FUJIMURA SATOSHI;AOKI HISASHI;

    申请日2016-03-08

  • 分类号G01N23/223;G01N23/207;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:57

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