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Volatile organic compound reduction device, volatile organic compound reduction method, and gas-liquid contact device

机译:挥发性有机化合物的还原装置,挥发性有机化合物的还原方法以及气液接触装置

摘要

PROBLEM TO BE SOLVED: To provide a treatment system materializing reduction in a supplementary water amount, maintaining of solvent absorption efficiency, high concentration of a volatile organic compound of treated liquid to be discharged, and reduction in an installation space.SOLUTION: There is provided a volatile organic compound reduction device reducing volatile organic compound using gas-liquid contact process, which brings gas to be treated containing an aqueous volatile organic compound passing through a single treatment tower into contact with treatment liquid to be supplied to the treatment tower, and which makes the treatment liquid absorb the volatile organic compound in the gas to be treated. The volatile organic compound reduction device has: a treatment tower 1 in which the gas to be treated is introduced; two circulation tanks 2A, 2B arranged in parallel with each other which supply the treatment liquid to the treatment tower; switching means 8, 20 of the circulation tanks for supplying the treatment liquid from one of the circulation tanks to the treatment tower and returning the treatment liquid from the treatment tower; means 25 for controlling and reducing concentration of the volatile organic compound in the treatment gas by managing the concentration of the volatile organic compound in the treatment liquid equal to or less than a set value; and draining means 23A, 23B which are provided in the two circulation tanks respectively and selectively drain the treatment liquid.
机译:解决的问题:提供一种处理系统,其实现了补充水量的减少,维持溶剂的吸收效率,待排放的待处理液体的挥发性有机化合物的高浓度以及安装空间的减少。一种挥发性有机化合物减少装置,其利用气液接触法来减少挥发性有机化合物,该装置使通过单一处理塔的含有含水挥发性有机化合物的被处理气体与被供给至处理塔的处理液体接触,并且使处理液吸收待处理气体中的挥发性有机化合物。挥发性有机化合物还原装置具有:处理塔1,在其中引入要处理的气体;以及处理塔1。彼此平行布置的两个循环罐2A,2B,它们向处理塔供应处理液。循环槽的切换装置8、20,用于从循环槽之一向处理塔供给处理液,并从处理塔返回处理液。装置25,用于通过将处理液中的挥发性有机化合物的浓度控制为设定值以下,来控制和降低处理气体中的挥发性有机化合物的浓度。排出装置23A,23B分别设置在两个循环槽中,并选择性地排出处理液。

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