METHOD OF PRODUCING MASK WITH USING COMMON BIAS VALUE IN OPTICAL PROXIMITY CORRECTION

摘要

The present invention relates to a mask manufacturing method which includes: a step of dividing an outline of a design layout into a plurality of segments; a step of setting comparison regions, each of which is formed with respect to an irradiation point corresponding to each of the segments; a step of calculating an area in which each of the comparison areas and the design layout are overlapped with each other; a step of classifying the segments into a plurality of groups so that segments, having the same overlapping area characteristics, can be included in one of the groups based on the calculated area; a step of calculating bias values corresponding to the segments, respectively; a step of obtaining representative bias values corresponding to the groups, respectively, based on the bias values corresponding to the segments, respectively, included in the respective groups; a step of allocating the representative bias values, corresponding to the groups including the segments, to the segments respectively; a step of updating the design layout based on the segments allocated with the representative bias values; and a step of manufacturing a mask based on the updated design layout. According to the present invention, optical proximity correction is more efficiently and equally performed.