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METHODS FOR DEPOSITING FLOWABLE SILICON CONTAINING FILMS USING HOT WIRE CHEMICAL VAPOR DEPOSITION
METHODS FOR DEPOSITING FLOWABLE SILICON CONTAINING FILMS USING HOT WIRE CHEMICAL VAPOR DEPOSITION
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机译:用热丝化学气相沉积法沉积可流动的含硅薄膜的方法
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摘要
In some embodiments, a method of processing a substrate disposed within a processing volume of a hot wire chemical vapor deposition (HWCVD) process chamber, includes: (a) providing a silicon containing precursor gas into the processing volume, the silicon containing precursor gas is provided into the processing volume from an inlet located a first distance above a surface of the substrate; (b) breaking hydrogen-silicon bonds within molecules of the silicon containing precursor via introduction of hydrogen radicals to the processing volume to deposit a flowable silicon containing layer atop the substrate, wherein the hydrogen radicals are formed by flowing a hydrogen containing gas over a plurality of wires disposed within the processing volume above the substrate and the inlet.
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