首页> 外国专利> LAYERED OXYGEN BARRIER ELECTRODES FOR RESISTIVE RANDOM ACCESS MEMORY (RRAM) DEVICES AND THEIR METHODS OF FABRICATION

LAYERED OXYGEN BARRIER ELECTRODES FOR RESISTIVE RANDOM ACCESS MEMORY (RRAM) DEVICES AND THEIR METHODS OF FABRICATION

机译:用于电阻随机存取存储器(RRAM)装置的层状氧气阻隔电极及其制造方法

摘要

A resistive random access memory (RRAM) device includes a bottom electrode disposed above a substrate, a top electrode disposed above the bottom electrode, an oxygen exchange layer disposed between the bottom electrode and the top electrode and a switching layer disposed between the bottom electrode and the top electrode. In an embodiment, the bottom or the top electrode includes at least two conductive layers, a first conductive layer and a second conductive layer disposed on the first conductive layer, where the first conductive layer has grain boundaries that are offset from grain boundaries of the second conductive layer.
机译:电阻式随机存取存储器(RRAM)装置包括:底部电极,设置在基板上方;顶部电极,设置在底部电极上方;氧交换层,设置在底部电极和顶部电极之间;以及开关层,设置在底部电极和顶部电极之间。顶部电极。在一个实施例中,底部或顶部电极包括至少两个导电层,第一导电层和设置在第一导电层上的第二导电层,其中第一导电层具有偏离第二导电层的晶界的晶界。导电层。

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