PROBLEM TO BE SOLVED: To expose a mask pattern at a more appropriate location of a plate while using a lens array.;SOLUTION: An exposure method irradiates a mask with illumination light via an illumination optical system and transfers a pattern formed on the mask onto a plate via a lens array. The method includes: arranging a plurality of masks along a non-scanning direction crossing a scanning direction, moving the illumination optical system and the lens array relatively in the scanning direction with regard to the mask and the plate, irradiating the pattern with the illumination light from the illumination optical system, and projecting an image of the pattern formed on the mask via the lens array onto a plate; and moving the plurality of masks projected onto the plate each relatively in the scanning direction.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2019,JPO&INPIT
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