首页> 外国专利> VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK DEVICE, VAPOR DEPOSITION MASK MANUFACTURING METHOD AND VAPOR DEPOSITION MASK DEVICE MANUFACTURING METHOD

VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK DEVICE, VAPOR DEPOSITION MASK MANUFACTURING METHOD AND VAPOR DEPOSITION MASK DEVICE MANUFACTURING METHOD

机译:汽相沉积掩模,汽相沉积掩模装置,汽相沉积掩模制造方法和汽相沉积掩模装置制造方法

摘要

A vapor deposition mask (20) comprises: a first mask (30) having an opening (35) formed therein; a second mask (40) that overlaps the first mask (30) and that has formed therein a plurality of through holes (45) having a planar dimension smaller than the planar dimension of the opening (35); and a plurality of bonding sections (16) for bonding the second mask (40) and the first mask (30) to each other. The plurality of bonding sections (16) are arranged along an outer edge (43) of the second mask (40), and a notch (46) is formed at a position corresponding to a space between two adjacent bonding sections (16) in the outer edge (43) of the second mask (40).
机译:气相沉积掩模(20)包括:第一掩模(30),第一掩模(30)具有形成在其中的开口(35);以及第一掩模(20)。第二掩模(40)与第一掩模(30)重叠,并且在其中形成有多个通孔(45),这些通孔的平面尺寸小于开口(35)的平面尺寸;多个接合部(16),用于使第二掩模(40)和第一掩模(30)彼此接合。沿着第二掩模(40)的外边缘(43)布置多个接合部分(16),并且在对应于两个相邻接合部分(16)之间的空间的位置处形成凹口(46)。第二掩模(40)的外边缘(43)。

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