首页> 外国专利> Apparatus for transporting a substrate, processing apparatus having a receiving plate adapted to a substrate carrier of such apparatus, and method for processing a substrate using the apparatus for transporting the substrate, and processing system

Apparatus for transporting a substrate, processing apparatus having a receiving plate adapted to a substrate carrier of such apparatus, and method for processing a substrate using the apparatus for transporting the substrate, and processing system

机译:用于输送基板的设备,具有适于该设备的基板载体的接收板的处理设备,以及使用用于输送基板的设备处理基板的方法和处理系统

摘要

The present invention includes a device for transporting a substrate into or from a processing apparatus, a method for processing the substrate, and a moving device for moving the apparatus for transporting the substrate. Regarding the processing system. In this case, the device for transporting the substrate includes a substrate carrier having a horizontally extending holding surface and one or more gripping arms. The first surface of the holding surface facing the substrate is formed flat and uniformly, the shape of the first surface substantially corresponds to the shape of the substrate, and the area of the first surface is the said. It is almost equal to the area of the substrate. In this case, the substrate is held on the holding surface on the rear surface of the substrate only by its gravity. The processing device has a storage plate. The substrate is held on the accommodating plate during processing. In this case, the accommodating plate has a recess in the first surface, and the recess is suitable for accommodating the substrate carrier during processing of the substrate.
机译:本发明包括用于将基板输送到处理设备中或从处理设备输送基板的设备,用于处理基板的方法以及用于移动用于输送基板的设备的移动设备。关于处理系统。在这种情况下,用于输送基板的设备包括基板承载器,该基板承载器具有水平延伸的保持表面和一个或多个夹持臂。面对基板的保持表面的第一表面形成为平坦且均匀的,第一表面的形状基本上对应于基板的形状,并且第一表面的面积是所述的。它几乎等于基板的面积。在这种情况下,仅通过基板的重力将基板保持在基板的背面的保持面上。该处理设备具有存储板。在处理期间,将基板保持在容纳板上。在这种情况下,容纳板在第一表面上具有凹部,并且该凹部适于在基板的处理期间容纳基板载体。

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