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Enabling High Throughput Electron Channeling Contrast Imaging (ECCI) by Varying Electron Beam Energy
Enabling High Throughput Electron Channeling Contrast Imaging (ECCI) by Varying Electron Beam Energy
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机译:通过改变电子束能量实现高通量电子通道对比度成像(ECCI)
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摘要
Techniques for high throughput electron channeling contrast imaging (ECCI) by varying electron beam energy are provided. In one aspect, a method for ECCI of a crystalline wafer includes: placing the crystalline wafer under an electron microscope having an angle of less than 90° relative to a surface of the crystalline wafer; generating an electron beam, by the electron microscope, incident on the crystalline wafer; varying an accelerating voltage of the electron microscope to access a channeling condition of the crystalline wafer; and obtaining an image of the crystalline wafer. A system for ECCI is also provided.
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