首页> 外国专利> COMPOSITION FOR UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR DIRECTED SELF-ASSEMBLED FILM AND FORMING METHOD THEREOF, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS

COMPOSITION FOR UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR DIRECTED SELF-ASSEMBLED FILM AND FORMING METHOD THEREOF, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS

机译:基底膜形成的组成,直接自组装膜的基底膜及其形成方法以及直接自组装光刻工艺

摘要

A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.
机译:组合物包括聚合物和溶剂。聚合物(A)满足条件(i)和(ii)中的至少一个:(i)在主链的一个末端部分具有包含氨基的第一结构单元的嵌段; (ii)在主链的一端具有硫原子的键,其中,具有氨基的一价基团与该硫原子键合。

著录项

  • 公开/公告号US2020040209A1

    专利类型

  • 公开/公告日2020-02-06

    原文格式PDF

  • 申请/专利权人 JSR CORPORATION;

    申请/专利号US201916528707

  • 申请日2019-08-01

  • 分类号C09D125/14;G03F7/11;C08F212/08;C08F220/14;C09D133/14;

  • 国家 US

  • 入库时间 2022-08-21 11:19:15

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