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COMPOSITION FOR UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR DIRECTED SELF-ASSEMBLED FILM AND FORMING METHOD THEREOF, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
COMPOSITION FOR UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR DIRECTED SELF-ASSEMBLED FILM AND FORMING METHOD THEREOF, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
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机译:基底膜形成的组成,直接自组装膜的基底膜及其形成方法以及直接自组装光刻工艺
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摘要
A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.
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