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3 A BISMUTHDOPED SEMIINSULATING GROUP NITRIDE WAFER AND ITS PRODUCTION METHOD
3 A BISMUTHDOPED SEMIINSULATING GROUP NITRIDE WAFER AND ITS PRODUCTION METHOD
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机译:3双掺半绝缘氮化硅晶片及其制备方法
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摘要
The present invention discloses a semi-insulating wafer of Ga x Al y In 1-xy N (0 ≦ x ≦ 1, 0 ≦ x + y ≦ 1) doped with bismuth (BI). The semi-insulating wafer has a resistance of at least 10 4 ohms / cm. Although it is very difficult to obtain single crystal ingots of Group 3 nitrides, the ammonothermal method can grow high oriented polycrystalline or single crystal ingots of Group 3 nitrides with dislocation / crystal grain density less than 10 5 cm −2 . The present invention also discloses a semi-insulating Group III nitride bulk crystal and method of making a wafer.
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机译:本发明公开了一种Ga x Sub> Al y Sub> In 1-xy Sub> N(0≤x≤1、0≤x + y≤1)掺有铋(BI)。半绝缘晶片的电阻至少为10 4 Sup>欧姆/厘米。尽管很难获得第3组氮化物的单晶锭,但是氨热法可以生长位错/晶粒密度小于10 5 Sup> cm <的高取向多晶或第3组氮化物的单晶锭。 Sup> −2 Sup>。本发明还公开了一种半绝缘的III族氮化物块状晶体和制造晶片的方法。
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