The present invention relates to a method for manufacturing a MEMS membrane structure, which includes the following steps of: forming a silicon oxide film dam structure on a silicon substrate; forming a sacrificial layer after depositing an adhesive layer; depositing a surface protective film on the sacrificial layer; forming trenches in a first row to a third row on the silicon oxide film dam structure by etching the surface protective film and the sacrificial layer; forming a membrane by depositing a support film at the inside of the trenches in the first row to the third row and on the surface protective film of the sacrificial layer; and forming an empty space by removing the sacrificial layer inside the support film deposited at the first row.
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