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LITHOGRAPHIC DEVICE LITHOGRAPHIC EXPOSURE DEVICE RECORDING MEDIUM HAVING PROGRAM RECORDED THEREON AND LITHOGRAPHIC PROCESS

机译:照相术照相术照相术记录介质记录有程序和照相术

摘要

Drawing device. The drawing device includes coordinate data indicating a first position that is a design position of a plurality of reference marks formed on a substrate to be exposed, coordinate data indicating a drawing pattern to be drawn on the substrate to be determined based on the first position, and An acquisition unit for acquiring coordinate data indicating a second position, which is an actual position of each of the plurality of reference marks, and a physical quantity representing a magnitude of deformation of the substrate to be exposed based on the first position and the second position In addition, each of the plurality of reference marks, a derivation unit for deriving a correction amount for the deviation of the first position and the second position, and a larger amount as the physical quantity increases from each of the correction amounts derived by the derivation unit When the drawing pattern is drawn on the substrate to be exposed on the basis of the second position, a reducing section to be reduced and a correction section to correct coordinate data indicating the drawing pattern based on the correction amount reduced by the reducing section. Doing.
机译:绘图设备。绘制装置包括:坐标数据,该坐标数据指示第一位置,该第一位置是在要曝光的基板上形成的多个参考标记的设计位置;坐标数据,该坐标数据指示要基于第一位置在要确定的基板上绘制的绘制图案;以及获取单元,其基于第一位置和第二位置,获取表示第二位置的坐标数据,该第二位置是多个参考标记中的每一个的实际位置,并且该物理量表示要曝光的基板的变形量。另外,多个基准标记中的每一个,用于从第一位置和第二位置的偏差中推导校正量的推导单元,以及随着物理量的增加而增大的量,该物理量从由参考点推导的每个推导单元当在第二位置的基础上在要曝光的基板上绘制绘制图案时,减小减少部分,以及校正部分,基于由减少部分减少的校正量来校正指示绘制图案的坐标数据。在做。

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