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Plating power supply using ethernet interface and headroom control
Plating power supply using ethernet interface and headroom control
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机译:使用以太网接口和裕量控制的电镀电源
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摘要
A system for controlling the operation of an apparatus for electroplating semiconductor substrates comprises a high mode of operation in which a ready-made power supply provides a current or voltage used directly to generate a channel control signal, and to generate a channel control signal, It involves operating in a low mode of operation where off-the-shelf power supplies bias circuits that provide current or voltage.
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