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Plating power supply with headroom control and ethercat interface
Plating power supply with headroom control and ethercat interface
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机译:具有裕量控制和ethercat接口的电镀电源
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摘要
A system for controlling the operation of apparatus for electroplating semiconductor substrates includes operating in a high mode of operation in which an off-the-shelf power supply provides current or voltage that is directly used to produce the channel control signal and in a low mode of operation in which the off-the-shelf power supply biases a circuit that provides a current or voltage to produce the channel control signal.
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