Sputter source with rotatable magnet system

摘要

Sputter source with rotatable magnet system (7), consisting of a base body (1) designed to hold a target (4), which can be used in a vacuum-tight and electrically insulated manner in an opening in the wall of a vacuum chamber (not shown) and in which the base body (1) has a A rotatably mounted magnet system (7) is provided on a flat base plate (2) of the base body (1), the base body (1) surrounding the magnet system (7) like a pot, and the target (4) on the opposite side of the magnet system (7) lying side of the flat base plate (2) is mounted. It is an object of the invention to minimize the deflection of the flat base plate of the base body of the sputter source in a sputter source with a rotatable magnet system. This is achieved in that the central area of the flat base plate (2) of the base body (1) is provided with a support in the base body (1) against deflection due to existing pressure differences, the support preferably consisting of a coaxial arrangement consisting of a hollow shaft (14 ) and a support axis (17) mounted in this, which is firmly connected to the flat base plate (2) via an axis attachment (19).