Design and Performance of a Moveable-Post Cathode Magnetron Sputtering System for Making PBFA (Particle Beam Fusion Accelerator) II Accelerator Ion Sources

摘要

A post cathode magnetron sputter deposition system is described for depositing one-two-or three layer coatings with uniform thickness and film properties on the inside of a cylindrical substrate. The system utilizes a unique moveable post cathode which allows the substrate to remain stationary during the deposition process. Film stress is controlled by cycling the sputtering pressure during the sputter deposition process. (ERA citation 12:026345)