Progress towards a 20 kV, 2 kA plasma source ion implantation modulator for automotive production of diamond film on aluminum

摘要

This paper provides the process requirements and the electrical design topology being developed to facilitate large scale production of amorphous diamond films on aluminum. The patented recipe, that includes other surface modification processes, requires various operational voltages, duty cycles, and current load regimes to ensure a high quality film. It is desirable to utilize a common modulator design for this relatively low voltage recipe. Processing may include target part cleaning, ion implantation, plasma deposition, and vacuum chamber cleaning. Modulator performance will have a direct impact on plant size and system economics. Unfortunately, process requirements are in a regime that is not easily achievable by solid state or very efficiently by vacuum tube devices. To accommodate the various process requirements, the authors are developing a modulator based on series connected hot decks utilizing high current, high voltage IGBT devices.