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首页> 外文期刊>Physica, E. Low-dimensional systems & nanostructures >Silicon based light emitters utilizing radiation from dislocations; electric field induced shift of the dislocation-related luminescence
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Silicon based light emitters utilizing radiation from dislocations; electric field induced shift of the dislocation-related luminescence

机译:利用位错辐射的硅基发光体;电场引起的位错相关发光的位移

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Dislocation rich regions can be controllably formed at a certain location inside a silicon wafer. We studied the light emission properties of such regions located in an electric Held of a p-n junction under different excitation conditions. It was found that the luminescence spectra of the dislocations are significantly influenced by the presence of the junction. The dislocation-related luminescence peak position appears red-shifted due to the built-in electric field. A suppression of that field by photogeneration of carriers or by applying a forward bias voltage at the junction leads to a gradual decrease in the energy position of the peaks. The dependence of the peak position on the electric field was found to be a quadratic function, similar to that observed for semiconductor nanostructures. We show that the shift of the peak position is due to the Stark effect on dislocation-related excitonic states. The characteristic constant of the shift, obtained by fitting the data with the quadratic Stark effect equation, was 0.0186 meV/(kV/cm)(2). The observed effect opens new possibilities for integration of a silicon based light emitter, combining the radiation from dislocations with a Stark effect based modulator.
机译:可以在硅晶片内的某个位置可控地形成位错富集区。我们研究了在不同激发条件下位于p-n结的电势保持中的此类区域的发光特性。已经发现,位错的发光光谱受到结的存在的显着影响。与位错相关的发光峰位置由于内置电场而出现红移。通过载流子的光生或在结处施加正向偏置电压来抑制该电场,会导致峰值的能量位置逐渐减小。发现峰位置对电场的依赖性是二次函数,类似于对半导体纳米结构观察到的函数。我们表明峰位置的移动是由于对位错相关的激子态的斯塔克效应。通过用二次斯塔克效应方程拟合数据获得的位移特征常数为0.0186 meV /(kV / cm)(2)。观察到的效应为集成硅基发光体提供了新的可能性,将位错辐射与基于Stark效应的调制器结合在一起。

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