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Stacking faults and grain boundaries of Ti_3SiC_2

机译:Ti_3SiC_2的堆垛层错和晶界

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Stacking faults and grain boundaries of Ti_3SiC_2 have been investigated by means of high-resolution electron microscopy. The stacking faults were found to result from insertion of additional TiC layers, instead of dissociation of dislocations conventionally observed in other materials. The stacking faults with many TiC layers inserted can also be viewed as TiC platelets. A glass phase is not formed at large-angle grain boundaries of Ti_3SiC_2, manifesting the weak directionality of bonding in Ti_3SiC_2. The results also indicate that the softening of Ti_3SiC_2 at high temperatures does not result from intergranular glass films but from an intrinsic property of Ti_3SiC_2. Moreover, it was found that one grain contacts the other with its base plane for most of the investigated grain boundaries.
机译:通过高分辨率电子显微镜研究了Ti_3SiC_2的堆垛层错和晶界。发现堆垛层错是由于插入了额外的TiC层,而不是其他材料中通常观察到的位错解离所致。插入了许多TiC层的堆垛层错也可以看作是TiC薄片。在Ti_3SiC_2的大角度晶界处未形成玻璃相,表明Ti_3SiC_2中键合的方向性较弱。结果还表明,高温下的Ti_3SiC_2软化不是由晶间玻璃膜引起的,而是由Ti_3SiC_2的固有性质引起的。此外,对于大多数研究的晶界,发现一种晶粒与另一种晶粒的底面接触。

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