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Preparation and properties of MgB2 thin films on LaAlO3 substrates by chemical vapour deposition

机译:LaAlO3衬底上化学气相沉积法制备MgB2薄膜及其性能

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Superconducting MgB2 thin films have been prepared on single crystal LaAlO3 (001) substrates by an improved chemical vapour deposition technique. First, boron precursor films were grown on LaAlO3 (001) substrates by chemical vapour deposition using B2H6 as a boron source. Magnesium was then incorporated into the films during a post-annealing process in the presence of high purity magnesium bulk at 890 degreesC for 40 min. The resultant MgB2 films on LaAlO3 substrates showed a random orientation with dense and well-formed grains in the films. Resistance and do magnetization measurements of the films revealed a sharp superconducting zero resistance transition temperature of 37.5 K, while magnetization hysteresis measurements yielded critical current density J(c) of 2.6 x 10(7) A cm(-2) at 15 K in zero field. [References: 14]
机译:已经通过改进的化学气相沉积技术在单晶LaAlO3(001)衬底上制备了超导MgB2薄膜。首先,使用B2H6作为硼源,通过化学气相沉积法在LaAlO3(001)衬底上生长硼前体膜。然后在高纯度镁本体存在下,在890℃下进行退火40分钟后,将镁掺入薄膜中。在LaAlO3衬底上生成的MgB2膜表现出随机取向,膜中有致密且形成良好的晶粒。薄膜的电阻和磁化强度测量显示了37.5 K的尖峰超导零电阻过渡温度,而磁化磁滞测量得出的零电流15 K下零的临界电流密度J(c)为2.6 x 10(7)A cm(-2)。领域。 [参考:14]

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