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Carroer Transport in Porous Silicon

机译:多孔硅中的载流子传输

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摘要

Carrier transport in porous silicon layers has been studied by the time-of-flight method in the strong injection mode at temperatures T = 290-350 K and electric field strengths F = (1.5-7) * 10~4 V cm~(-1). The electron and hole drift mobilities μ_e ≈ 2 * 10~(-3) cm~2 V~(-1) s~(-1) were obtained at T = 292 K and F = 4 * 10~4 V cm~(-1). An exponential temperature dependence of drift mobility with activation energy of ~0.41 eV for, respectively, electrons and holes was established. It is shown that the type of time dependences of the photocurrent associated with carrier drift and the superlinear dependence of the transit time on the reciprocal of the voltage applied to a sample allow use of the concept of space-charge-limited currents under the conditions of anomalous dispersive transport. The experimental data are accounted for in terms of the model of transport controlled by carrier trapping into localized states with energy distribution near the conduction and valence band edges described by an exponential function with a characteristic energy of ~0.03 eV.
机译:已经通过飞行时间方法以强注入模式在温度T = 290-350 K和电场强度F =(1.5-7)* 10〜4 V cm〜(-的情况下,研究了多孔硅层中的载流子传输。 1)。在T = 292 K和F = 4 * 10〜4 V cm〜()时获得电子和空穴漂移率μ_e≈2 * 10〜(-3)cm〜2 V〜(-1)s〜(-1) -1)。分别建立了电子和空穴的漂移迁移率与活化能〜0.41 eV的指数关系。结果表明,与载流子漂移相关的光电流的时间依赖性和传输时间与施加到样品的电压的倒数的超线性相关性允许在以下条件下使用空间电荷限制电流的概念:异常分散运输。实验数据是通过载流子俘获进入局部状态的传输模型来解释的,该局部状态具有在导带和价带边缘附近的能量分布,其特征函数为〜0.03 eV,由指数函数描述。

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