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首页> 外文期刊>Radiation Research: Official Organ of the Radiation Research Society >Differential expression of oxidative stress and extracellular matrix remodeling genes in low- or high-dose-rate photon-irradiated skin
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Differential expression of oxidative stress and extracellular matrix remodeling genes in low- or high-dose-rate photon-irradiated skin

机译:低或高剂量率光子辐照皮肤中氧化应激和细胞外基质重塑基因的差异表达

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Changes in the expression of genes implicated in oxidative stress and in extracellular matrix (ECM) remodeling and selected protein expression profiles in mouse skin were examined after exposure to low-dose-rate or high-dose-rate photon irradiation. ICR mice received whole-body rays to total doses of 0, 0.25, 0.5 and 1 Gy at dose rates of 50 cGy/h or 50 cGy/min. Skin tissues were harvested for characterization at 4 h after irradiation. For oxidative stress after low-dose-rate exposure, 0.25, 0.5 and 1 Gy significantly altered 27, 23 and 25 genes, respectively, among 84 genes assessed (P < 0.05). At doses as low as 0.25 Gy, many genes responsible for regulating the production of reactive oxygen species (ROS) were significantly altered, with changes >2-fold compared to 0 Gy. For an ECM profile, 18-20 out of 84 genes were significantly up- or downregulated after low-dose-rate exposure. After high-dose-rate irradiation, of 84 genes associated with oxidative stress, 16, 22 and 22 genes were significantly affected after 0.25, 0.5 and 1 Gy, respectively. Compared to low-dose-rate radiation, high-dose-rate exposure resulted in different ECM gene expression profiles. The most striking changes after low-dose-rate or high-dose-rate exposure on ECM profiles were on genes encoding matrix metalloproteinases (MMPs), e.g., Mmp2 and Mmp15 for low dose rate and Mmp9 and Mmp11 for high dose rate. Immunostaining for MMP-2 and MMP-9 proteins showed radiation dose rate-dependent differences. These data revealed that exposure to low total doses with low-dose-rate or high-dose-rate photon radiation induced oxidative stress and ECM-associated alterations in gene expression profiles. The expression of many genes was differentially regulated by different total dose and/or dose-rate regimens.
机译:在暴露于低剂量率或高剂量率光子照射后,检查了小鼠皮肤中氧化应激和细胞外基质(ECM)重塑相关基因表达的变化以及选定的蛋白质表达谱。 ICR小鼠以50 cGy / h或50 cGy / min的剂量率接受全身射线,剂量分别为0、0.25、0.5和1 Gy。照射后4小时收获皮肤组织用于表征。对于低剂量率暴露后的氧化应激,在评估的84个基因中,0.25、0.5和1 Gy分别显着改变了27、23和25个基因(P <0.05)。在低至0.25 Gy的剂量下,许多负责调节活性氧(ROS)产生的基因发生了显着改变,与0 Gy相比,变化> 2倍。对于ECM,低剂量率暴露后84个基因中有18-20个被显着上调或下调。高剂量率照射后,与氧化应激相关的84个基因中,分别在0.25、0.5和1 Gy后显着影响了16、22和22个基因。与低剂量辐射相比,高剂量辐射导致了不同的ECM基因表达谱。在低剂量率或高剂量率暴露于ECM配置文件后,最显着的变化是编码基质金属蛋白酶(MMP)的基因,例如,低剂量率的Mmp2和Mmp15以及高剂量率的Mmp9和Mmp11。 MMP-2和MMP-9蛋白的免疫染色显示辐射剂量率依赖性。这些数据表明,低剂量率或高剂量率光子辐射暴露于低总剂量下会引起氧化应激和基因表达谱中与ECM相关的改变。许多基因的表达受到不同的总剂量和/或剂量率方案的差异调节。

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