Advances in optical microscopy have enabled unprecedented achievement in metrology and imaging. A new low-cost technique promises substantial impact on manufacturing productivity, process control, and calibration standards. Scatterfield optical imaging is a new technique that makes possible high-throughput measurement of sub-10 nm features using advanced, low-cost optical methods. It has the potential to substantially impact manufacturing productivity and process control, and to provide the measurement basis for new calibration standards well beyond the current state of the art. Researchers are developing this technique as part of the Advanced Optics Initiative of the Next Generation Nanometrology Program at the National Institute of Standards and Technology (NIST). The ultimate goal of this work is development of a high throughput measurement technique capable of imaging sub-10 nm features with sensitivity to nanometer-scale geometrical changes.
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