首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Underpotential deposition of silver onto gold substrates covered with self-assembled monolayers of alkanethiols to induce intervention of the silver between the monolayer and the gold substrate
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Underpotential deposition of silver onto gold substrates covered with self-assembled monolayers of alkanethiols to induce intervention of the silver between the monolayer and the gold substrate

机译:银在沉积有烷硫醇自组装单层的金基底上的电位不足,以诱导银在单层和金基底之间的介入

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摘要

Underpotential deposition (UPD) of Ag on Au(111)/mica electrodes coated with a self-assembled monolayer (SAM) of propanethiol or octanethiol and reductive desorption of the SAM after conducting UPD have been studied using voltammetry, XPS measurement, and scanning tunneling microscopy (STM). The reductive desorption potential of the SAM was changed by UPD of Ag from a characteristic value obtained at Au to that at Ag, indicating that the UPD of Ag took place through the SAM layer in such a way as to intervene between the SAM and the Au electrode. No significant loss of thiol molecules occurred during the Ag deposition. The rate of UPD through the SAM of propanethiol was so fast as to be completed within 10 s, while that for the SAM of octanethiol took ca. 50 min or more to build up the SAM/Ag/Au structure. Voltammetric results indicated that the UPD of Ag proceeded initially at molecular defects in the SAM of octanethiol and that the resulting Ag islands grew laterally to limiting coverage. Ex situ STM observations showed clearly the presence of such Ag islands on terraces of the Au(111) electrode surface. [References: 21]
机译:研究了使用伏安法,XPS测量和扫描隧道效应研究了在丙烷(A)(111)/云母电极上涂有丙烷硫醇或辛硫醇的自组装单分子膜(SAM)的Ag的欠电位沉积(UPD)和SAM的还原脱附显微镜(STM)。 Ag的UPD将Au的还原脱附电位从Au处的特征值改变为Ag处的特征值,这表明Ag的UPD发生在SAM层和Au之间,并通过SAM层发生电极。在Ag沉积过程中,硫醇分子没有明显损失。通过丙硫醇的SAM的UPD速率如此之快,以至于在10 s内即可完成,而辛硫醇的SAM的UPD速率大约为10s。 50分钟或更长时间以建立SAM / Ag / Au结构。伏安法结果表明,Ag的UPD最初在辛烷硫醇SAM中的分子缺陷处进行,并且所得的Ag岛横向生长以限制覆盖范围。异位STM观察清楚地表明在Au(111)电极表面的台阶上存在此类银岛。 [参考:21]

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