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Formation of Thick Textured Carbon Film Using Filtered Cathodic Vacuum Arc Technique

机译:过滤阴极真空电弧技术形成厚质碳膜

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In this work, thick textured carbon film (800 nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Scanning electron microscope was used for examining the film surface condition. There was no delamination area found on the thick film deposited using multi-cycle deposition. The bonding composition was investigated using X-ray photoelectron spectroscopy, higher sp~2 content was detected for the thick film. And the microstructure of the film was studied using visible Raman spectroscopy, the Raman results showed the typical features of textured carbon for the thick film. The electrical resistivity measured also suggested the thick film grown using this method exhibiting excellent electrical performance.
机译:在这项工作中,使用过滤的阴极真空电弧技术在Si衬底上生长了厚的织构碳膜(800 nm)。进行多循环沉积以避免高膜应力问题,从而提高膜粘附性。使用扫描电子显微镜检查膜表面状况。在使用多循环沉积法沉积的厚膜上未发现分层区域。使用X射线光电子能谱研究了键合成分,发现厚膜的sp〜2含量更高。并利用可见拉曼光谱研究了薄膜的微观结构,拉曼结果显示了厚膜的织构碳的典型特征。所测量的电阻率还暗示了使用该方法生长的厚膜表现出优异的电性能。

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