...
首页> 外文期刊>Nanoscience and Nanotechnology Letters >Strict Anderson Photon Localization of Amorphous Silicon Carbide
【24h】

Strict Anderson Photon Localization of Amorphous Silicon Carbide

机译:非晶碳化硅的严格安德森光子定位

获取原文
获取原文并翻译 | 示例
           

摘要

Based on the Mie scattering theory and the low density approximation, the strict Anderson photon localizations of 3 kinds of amorphous silicon carbide inverse opal photonic crystals were researched theoretically. The results show that the strict localization phenomena could densely occur in the anomalous dispersion region of amorphous silicon carbide. Moreover, there exists a tendency that the maximum localization parameter would increase and shift to larger radius with the decreasing relative refractive index or increasing incident wavelength. In addition, the combination of 10.65-μm nitrous oxide laser and the scatterer stuffing of Air may be more beneficial to achieving the strict localization of amorphous silicon carbide for the larger localization parameter.
机译:基于米氏散射理论和低密度近似理论,对3种非晶碳化硅反蛋白石光子晶体的严格安德森光子定位进行了理论研究。结果表明,在非晶碳化硅的异常色散区域中,可能严格地发生严格的局域化现象。此外,存在如下趋势:随着相对折射率减小或入射波长增大,最大定位参数将增大并向更大的半径偏移。此外,对于较大的定位参数,将10.65μm的一氧化二氮激光器和空气的散射填充物结合使用可能更有利于实现非晶碳化硅的严格定位。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号