首页> 外文期刊>Mutation Research: International Journal on Mutagenesis, Chromosome Breakage and Related Subjects >In vitro photochemical clastogenicity of quinolone antibacterial agents studied by a chromosomal aberration test with light irradiation.
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In vitro photochemical clastogenicity of quinolone antibacterial agents studied by a chromosomal aberration test with light irradiation.

机译:喹诺酮类抗菌剂的体外光化学致裂性通过光照射下的染色体畸变试验研究。

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摘要

The photochemical clastogenic potential of 12 quinolone antibacterial agents with or without light irradiation was assessed by an in vitro chromosomal aberration test using cultured CHL cells. Exposure to all test compounds, except for DK-507k, increased the incidence of cells with structural aberrations excluding gap (TA) following light irradiation. Test compounds used in the present study under light irradiation were divided into three groups based on their ED(50) values, doses inducing chromosomal aberrations in 50% of cells. The first group with ED(50) values below 30 microg/ml includes sparfloxacin (SPFX), clinafloxacin (CLFX), gemifloxacin (GMFX), lomefloxacin (LFLX), sitafloxacin (STFX), grepafloxacin (GPFX) and fleroxacin (FLRX); the second group with ED(50) values of 100 microg/ml, enoxacin (ENX) and levofloxacin (LVFX); the third group with little or no potency, moxifloxacin (MFLX), trovafloxacin (TVFX) and DK-507k. The photochemical clastogenicity of these compounds correlates well with their reported in vivo phototoxic potentials. In the chemical structure and clastogenicity relationships, substitution of a methoxy group at the C-8 position in the quinolone nucleus was confirmed to reduce not only photochemical clastogenicity, but also the clastogenic potential of quinolone antibacterial agents.
机译:使用培养的CHL细胞,通过体外染色体畸变测试评估了12种喹诺酮类抗菌剂在有光照射或无光照射下的光化学裂解潜力。暴露于除DK-507k以外的所有测试化合物下,增加了光照射后细胞结构畸变(间隙(TA)除外)的发生率。根据其ED(50)值(在50%的细胞中引起染色体畸变的剂量),将本研究中在光照射下使用的测试化合物分为三组。 ED(50)值低于30 microg / ml的第一组包括司帕沙星(SPFX),克林沙星(CLFX),吉非沙星(GMFX),洛美沙星(LFLX),西他沙星(STFX),格列沙星(GPFX)和氟西沙星(FLRX);第二组的ED(50)值为100微克/毫升,依诺沙星(ENX)和左氧氟沙星(LVFX);第三组几乎没有或没有效力,莫西沙星(MFLX),曲伐沙星(TVFX)和DK-507k。这些化合物的光化学致裂性与其报道的体内光毒性潜力有很好的相关性。在化学结构和致裂性关系中,已确认在喹诺酮核的C-8位取代甲氧基不仅降低了光化学致裂性,而且降低了喹诺酮抗菌剂的致裂性。

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