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Non-uniformity emendation technique for amorphous silicon flat-panel detectors used for industrial X-ray digital radiography

机译:工业X射线数字射线照相用非晶硅平板探测器的不均匀校正技术

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摘要

This paper proposes a non-uniformity emendation technique to solve the problem of non-linear of detector sensitivity for non-uniformity of amorphous silicon flat-panel detectors based on pixel sensitivity mean value. The technique corrects the testing image with the emendation factors obtained by the fitting of a standard reference group images, captured at a fixed tube voltage and different tube currents, to their mean value according to the concept of linear-fitting emendation. By reducing the input range, it meets the condition of linear system by converting non-linear emendation to linear emendation and actualizes the corresponding pixel fitting linearity. Experimental results indicate that the emendation technique provides higher image elements sensitivity which means wider system dynamic range and better signal-noise-ratio (1.3 times) with the reduction of standard deviation compared with normal linear emendation.
机译:提出了一种非均匀性校正技术,以解决基于像素灵敏度均值的非晶硅平板探测器非均匀性的探测器灵敏度非线性问题。该技术根据线性拟合校正的概念,使用校正系数校正测试图像,校正系数是通过将在固定管电压和不同管电流下捕获的标准参考组图像进行拟合而得到的校正系数,将校正图像校正为其平均值。通过减小输入范围,将非线性校正转换为线性校正,从而满足线性系统的条件,并实现了相应的像素拟合线性度。实验结果表明,与标准线性校正相比,该校正技术提供了更高的图像元素灵敏度,这意味着系统动态范围更广,信噪比更好(1.3倍),并且标准偏差减小。

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