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Stress field due to a dislocation loop in a heterogeneous thin film-substrate system

机译:异质薄膜-衬底系统中由于位错环引起的应力场

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In this paper, a superposition method is proposed to compute the stress field due to a dislocation loop in a heterogeneous thin film - substrate system. The problem is decomposed into two sub-problems: the stresses due to a dislocation loop in an infinitely extended bi-material space and the stresses induced by equivalent tractions on the free surface. The area-integral expression of the former is further reformulated in a line-integral form. Taking advantage of the Galerkin potential method and the Fourier transform, this paper then derives the elastic field in a heterogeneous thin film - substrate system due to surface loading. Numerical results demonstrate that both the free surface and the material heterogeneity have great influence on the stress field due to a dislocation loop.
机译:在本文中,提出了一种叠加方法来计算异质薄膜-衬底系统中由于位错环引起的应力场。该问题被分解为两个子问题:无限扩展的双材料空间中的位错环引起的应力,以及自由表面上等效牵引力引起的应力。前者的区域积分表达进一步以线积分形式重新制定。利用Galerkin势方法和傅立叶变换,然后得出了表面载荷导致的异质薄膜-基底系统中的弹性场。数值结果表明,由于位错环,自由表面和材料的异质性对应力场都有很大的影响。

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