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首页> 外文期刊>Modern Physics Letters, B. Condensed Matter Physics, Statistical Physics, Applied Physics >STUDY OF ESR, DEFECT STRUCTURE AND SURFACE MORPHOLOGY OF Cu~(2+) IN CdS CRYSTALS
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STUDY OF ESR, DEFECT STRUCTURE AND SURFACE MORPHOLOGY OF Cu~(2+) IN CdS CRYSTALS

机译:CdS晶体中Cu〜(2+)的ESR,缺陷结构和表面形貌的研究

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摘要

Cu-doped Cadmium sulfide (CdS) films were prepared by chemical bath deposition method. Various quantities of Cu were used for mixing. Surface characterization, structure, morphology and defect structures of the films were studied. The structure of all Cu-doped CdS films was a unique CdS cubic phase. The grain size of CdS was decreased when doped with Cu. The F-type defect in the undoped CdS is clearly confirmed by an ESR signal arising from the hyperfine interaction of electron spin (S=1/2) trapped in sulfur vacancies and neighboring cadmium nuclear spin (I=1/2). In the Cu-doped CdS films, the ESR peaks shift towards low fields as the copper concentration is increased. This is due to the change in crystal field experience by Cu2+ (3d9) ions while the Cd2+ signal disappears. The Cu2+ ions in the Cd1-xCuxS itself are ESR silent due to a very short relaxation time. The dark resistance increased with increasing amount of Cu concentrations up to about 0.03 M. This 0.03 M Cu-doped CdS sample also possesses the maximum photosensitivity.
机译:采用化学浴沉积法制备了掺Cu硫化镉(CdS)薄膜。各种数量的铜用于混合。研究了薄膜的表面表征,结构,形貌和缺陷结构。所有掺杂Cu的CdS薄膜的结构都是独特的CdS立方相。掺杂Cu后,CdS的晶粒尺寸减小。 ESR信号清楚地证实了未掺杂CdS中的F型缺陷,该信号是由捕获在硫空位中的电子自旋(S = 1/2)和邻近的镉核自旋(I = 1/2)的超精细相互作用引起的。在铜掺杂的CdS膜中,随着铜浓度的增加,ESR峰向低电场移动。这是由于Cu2 +(3d9)离子在Cd2 +信号消失的同时改变了晶体场。由于非常短的弛豫时间,Cd1-xCuxS本身中的Cu2 +离子是无ESR的。暗电阻随Cu浓度的增加而增加,直至约0.03M。0.03M的Cu掺杂CdS样品也具有最大的光敏性。

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