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Developing electrodeposition techniques for preconcentration of ultra-traces of Ni,Crand Pb prior to arc-atomic emission spectrometry determination

机译:开发用于电弧原子发射光谱法测定之前痕量镍,痕量铅超浓缩的电沉积技术

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Electrodeposition is known to be proper for separation and preconcentration of extremely lowconcentrations of analytes from the bulk sample which is instrumentally very simple. In the present research,a combination of electrodeposition with arc atomic emission spectrometry(ED-AAES)method hasbeen developed in order to improve the analytical performance of this spectrometry technique. The results show that sensitivity and detection limits by using ED-AAES were improved 1000-2000 folds over those ofnormal arc atomic emission spectrometry in determination of the selected elements.The detection limits formeasurement of Ni,Cr and Pb were 2.56,3.05 and 2.11 μg L1 for monodeposition and 3.31,3.72 and 3.25 μgL1 for simultaneously deposition, respectively.The precision of determinationwas in the range of 2-4% RSD.Typical calibration graphs for these elements were linear up to 100 μg L1,depending on the element andmatrix.Application of this technique was also tested on determination of the studied elements in an electroplatingplant's waste water.The accuracy of technique was verified by comparing the results of the waste water analysis with those of electrothermal atomic absorption spectroscopy as a reference standard method.The obtained results show that the combined technique(ED-AAES)has been progressed substantially toward the ultimate goal of direct interference-free determination of trace analysis in complex samples by AAES.
机译:众所周知,电沉积适用于从整体样品中分离和预浓缩极低浓度的分析物,这在仪器上非常简单。在本研究中,已经开发了电沉积与电弧原子发射光谱法(ED-AAES)相结合的方法,以提高该光谱技术的分析性能。结果表明,ED-AAES的灵敏度和检出限比常规电弧原子发射光谱法提高了1000-2000倍。选择镍,铬和铅的检出限分别为2.56、3.05和2.11μg单次沉积的L1和同时沉积的L1分别为3.31、3.72和3.25μgL1。测定精度在2-4%RSD范围内。这些元素的典型校正图线性最高为100μgL1,具体取决于元素和基质。还测试了该技术在测定电镀厂废水中所研究元素中的应用,并通过将废水分析结果与电热原子吸收光谱法作为参考标准方法进行比较,验证了该技术的准确性。表明组合技术(ED-AAES)在朝着直接无干扰检测的最终目标迈进了实质性进展通过AAES消除复杂样品中的痕量分析。

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