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Effect of Small Amount of Insoluble Dopant on Tetragonal to Monoclinic Phase Transformation in Tetragonal Zirconia Polycrystal

机译:少量不溶性掺杂对四方氧化锆多晶体四方至单斜相转变的影响

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摘要

The effect of small amount of insoluble dopant on tetragonal to monoclinic (t-m) phase transformation of 3 mol percent Y_2O_3 stabilized tetragonal zirconia polycrystal (3Y-TZP) is examined by ageing in hot water. The materials used are 3Y-TZP and 0.1 mol percen SiO_2-doped 3Y-TZP with grain size of 0.55 tun. The t-m phase transformation of 3Y-TZP is retarded by 0,1 mol percent SiO_2 doping. Since the doped silicon ion segregates along the grain boundaries, the change in phase transformation behavior must be originated from the change in grain boundary diffusivity of hydroxyl ion. Analysis of the transformation kinetics by the Mehl-Avrami-Johnson equation reveals that the activation energy does not change in the two materials but the pre-exponential term significantly changes. Grain boundary diffusion of hydroxyl ion must be blocked by the presence of silicon ion which reduces the effective area of grain boundary diffusion.
机译:通过在热水中老化,检查了少量不溶性掺杂剂对3摩尔%Y_2O_3稳定的四方氧化锆多晶体(3Y-TZP)的四方相向单斜相(t-m)相转变的影响。所使用的材料是3Y-TZP和0.1 mol percent SiO_2掺杂的3Y-TZP,晶粒尺寸为0.55 tun。 3Y-TZP的t-m相变受0.1 mol%SiO_2掺杂的阻碍。由于掺杂的硅离子沿晶界偏析,因此相变行为的变化必须源自羟基离子的晶界扩散率的变化。通过Mehl-Avrami-Johnson方程对转变动力学的分析表明,两种材料的活化能均未改变,但指数前项显着改变。氢氧根离子的晶界扩散必须通过硅离子的存在来阻止,这会减小晶界扩散的有效面积。

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