The mathematical models of the stripping voltammetry metal deposition/dissolution process

摘要

Three mathematical models of electrochemical two-electron deposition/dissolution process have been presented and discussed. The advanced two-plate model with BET adsorption formula equation has been presented and verified by the use of the experimental Cu~(2+)/Cu~+/Cu~0 system in 0.5 M HCl solution at different scan rates. A change of electrode properties during electrode process was included into applied model and discussed.