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HYDROGEN INTERACTION WITH SHALLOW AND DEEP CENTERS IN GAAS

机译:气体在浅层和深层中的氢相互作用

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The results of detailed theoretical investigations of the properties of atomic and diatomic H in GaAs were analyzed with the effort to give a unified picture of the H behavior in this semiconductor. All calculations were performed in the pseudopotential density-functional framework using a supercell approach. We studied both shallow impurities (Si and C) and deep point defects (As antisite and Ga vacancy). Generally, a simple scheme may be applied in order to describe the H interaction with shallow impurities, where a key role is played by the amphoteric character of H. More complex mechanisms are involved in the deep impurity case that are related to new, interesting effects of H incorporation in GaAs. (C) 1996 John Wiley & Sons, Inc. [References: 44]
机译:分析了GaAs中原子和双原子H性质的详细理论研究结果,以期给出这种半导体中H行为的统一图。所有计算均使用超级单元方法在准电势密度函数框架中进行。我们研究了浅杂质(Si和C)和深点缺陷(作为反位和Ga空位)。通常,可以应用一个简单的方案来描述H与浅层杂质的相互作用,其中H的两性特征起着关键作用。深层杂质情况涉及更复杂的机制,这些机制与新的有趣效应相关GaAs中的H掺入量。 (C)1996 John Wiley&Sons,Inc. [参考:44]

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