Corrigendum to ' Electrified thin film flow at finite Reynolds number on planar substrates featuring topography' [International Journal of Multiphase Flow 44 (2012) 48-69]

Veremieiev S.; Thompson H.M.; Scholle M.; Lee Y.C.; Gaskell P.H.

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Corrigendum to ' Electrified thin film flow at finite Reynolds number on planar substrates featuring topography' [International Journal of Multiphase Flow 44 (2012) 48-69]

机译：更正“具有地形特征的平面基板上有限雷诺数下的电气化薄膜流” [国际多相流杂志44（2012）48-69]

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《International Journal of Multiphase Flow》 |2013年第null期|共1页
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Veremieiev S.; Thompson H.M.; Scholle M.; Lee Y.C.; Gaskell P.H.;
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1. Corrigendum to " Electrified thin film flow at finite Reynolds number on planar substrates featuring topography" [International Journal of Multiphase Flow 44 (2012) 48-69] [J] . Veremieiev S., Thompson H.M., Scholle M., International Journal of Multiphase Flow . 2013,第Null期

机译：更正“具有地形特征的平面基板上有限雷诺数下的电气化薄膜流” [国际多相流杂志44（2012）48-69]
2. Corrigendum to "A mechanics approach for wet gas flow metering, theory and application to flow loop tests" [International Journal of Multiphase Flow 37 (2011) 260-267] [J] . Cadalen S., Lance M. International Journal of Multiphase Flow . 2011,第8期

机译：“湿式气体流量计量的力学方法，理论和流回路测试的应用”勘误表[国际多相流杂志37（2011）260-267]
3. Electrified film flow over step topography at zero Reynolds number: an analytical and computational study [J] . D. Tseluiko, M. G. Blyth, D. T. Papageorgiou, Journal of engineering mathematics . 2011,第2a3期

机译：雷诺数为零时阶跃形貌上的电化膜流动：分析和计算研究
4. Stokes flow, reynolds flow, molecular flow: restrictions on modeling thin films [C] . Andras Z. Szeri ASME international mechanical engineering congress and exposition . 2000

机译：斯托克斯流，雷诺流，分子流：对薄膜建模的限制
5. Electrified thin film flow at finite Reynolds number on planar substrates featuring topography [O] . Veremieiev, Sergii, Thompson, H. M., Scholle, M, 2012

机译：具有特征形的平面基板上的雷诺数有限的带电薄膜流
6. Validation of Electrical-Impedance Tomography for Measurements of Material Distribution in Two-Phase Flows; International Journal of Multiphase Flow [R] . Ceccio, S. L. , George, D. L. , O'Hern, T. J. , 1998

机译：验证电阻抗断层成像测量两相流中的材料分布;国际多相流杂志

Corrigendum to ' Electrified thin film flow at finite Reynolds number on planar substrates featuring topography' [International Journal of Multiphase Flow 44 (2012) 48-69]

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