A new procedure for the photoelastic determination of mode I SIF

摘要

A new photoelastic procedure for the calculationof SIF K1, based on the analysis of linear-elastic stress field in thevicinity of crack tip and stress-optic law is proposed in this paper.The procedure takes the effect of far-field stress, σox, on SIFinto consideration. The only information needed in this method isthe length of isochronatic fringe loop and the relevant fringeorder. The method is examined by three kinds of specimens underdifferent load cases. The obtained experimental results are thencompared with those evaluated by theoretical and otherphotoelastic methods, comparison shows that the method is notonly quite simple but also of higher precision.