Graduate School of Pharmaceutical Sciences, The University of Tokyo, The HFRE Division, ERATO, Japan Science and Technology Agency (JST), Hongo, Bunkyo-ku, Tokyo 113-0033, Japan

摘要

The last decade has witnessed the development of a dichotomy in scanning-probe lithographic (SPL) approaches and systems.[1]-[4] These techniques are either: 1) constructive, such as dip-pen nanolithography (DPN),[1], [2] and involve the delivery of molecules or other materials that can chemically or physically anchor to the underlying substrate, or 2) destructive (e.g. anodic oxidation[5], [6] and nanografting[7]) and involve the delivery of energy (in the form of heat, force, or current) to a surface that results in the physical change, chemical transformation, or displacement of the underlying material.[3], [4] The design demands for parallelization of the two approaches are daunting but extremely different because of the fundamental difference between delivering energy and chemical materials. In fact, the only example of massively parallel SPL is the millipede, which has been limited to destructive patterning involving polymer thermal indentation and annealing.[8]-[10] Since throughput is the biggest limitation of the constructive DPN technology, large area parallelization capabilities must be developed to realize its full potential.[3], [4], [11], [12] However, parallelization must be accomplished with the constraints and capabilities of the DPN technique in mind. Herein, we describe a solution to DPN parallelization through the development, fabrication, and use of a novel 55 000-pen two-dimensional (2D) array to pattern gold substrates with sub-100-nm resolution over square centimeter areas (Scheme 1).