Selectively Patterned Regrowth of Bilayer Graphene for Self-Integrated Electronics by Sequential Chemical Vapor Deposition

摘要

There is a critical demand for the highly qualified synthesis of graphene with precisely controlled thickness over a large coverage area. Selective growth can be considered as one method of preparing a vertically stacked graphene, but it usually requires elaborately alloyed substrates for chemical vapor deposition (CVD). Here, we report on a newly developed synthesis strategy for a selectively patterned grown graphene sheet in a spatially defined multithickness scale, exhibiting single- and bilayer graphene produced by a conventional CVD process. In particular, a sequential CVD growth technique on a single Cu substrate was used to produce highly ordered and alternatively patterned single- and bilayer graphene, maintaining its continuous configuration in a simplified and scalable manner. Our regrowth process did not require multiple transfer procedures or an alloying catalytic substrate to satisfy the properties of graphene associated with the needs for various applications. We also investigated the most valid mechanisms for our regrowth CVD process, which suggests that it is useful for the cost-effective synthetic approach into a built-in heterostructured single- and bilayer graphene. Finally, we demonstrated the possible accesses of transparent flexible electrodes and monolithically self-integrated all-graphene-based thin-film transistors to fully utilize regrown graphene.