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Electrical Contact Properties between the Accumulation Layer and Metal Electrodes in Ultrathin Poly(3-hexylthiophene)(P3HT) Field Effect Transistors

机译:超薄聚(3-己基噻吩)(P3HT)场效应晶体管中积累层与金属电极之间的电接触特性

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摘要

Probing contact properties between an ultrathin conjugated polymer film and metal electrodes in field effect transistors (FETs) is crucial not only to understanding charge transport properties in the accumulation layer but also in building organic sensors with high sensitivity. We investigated the contact properties between gold electrodes and poly(3-hexylthiophene) (P3HT) as a function of film thickness using gated four-point sheet resistance measurements. In an FET with a 2 nm thick P3HT film, a large voltage drop of 1.9 V (V_D =-3 V) corresponding to a contact resistance of 2.3 x 10~8 Ω was observed. An effective FET mobility of 1.4 x 10~(-3) cm~2/(Vs) was calculated when the voltage drop at the contacts was factored out, which is approximately a factor of 3 greater than the twocontact FET mobility of 5.5 x 10~(-4)cm~2/(Vs).Asharp decrease in the ratio of the contact resistance to the channel resistance was observed with increasing film thickness up to a thickness of approximately 6 nm, separating a contact limited regime from a charge transport limited regime. The origin of the large contact resistance observed in the device prepared with an ultrathin P3HT film is discussed in light of results from X-ray diffraction (XRD) and atomic force microscopy (AFM) studies.
机译:在场效应晶体管(FET)中探查超薄共轭聚合物薄膜与金属电极之间的接触特性不仅对于了解累积层中的电荷传输特性至关重要,而且对于构建具有高灵敏度的有机传感器也至关重要。我们使用门控四点薄层电阻测量研究了金电极与聚(3-己基噻吩)(P3HT)之间的接触特性,该特性是膜厚度的函数。在具有2 nm厚P3HT膜的FET中,观察到1.9 V(V_D = -3 V)的大压降,对应于2.3 x 10〜8Ω的接触电阻。当排除触点上的压降时,计算出的有效FET迁移率为1.4 x 10〜(-3)cm〜2 /(Vs),这比5.5 x 10的双触点FET迁移率大约3倍。 〜(-4)cm〜2 /(Vs)。随着膜厚增加到大约6 nm,观察到接触电阻与沟道电阻之比的急剧下降,将接触限制机制与电荷传输分开有限的制度。根据X射线衍射(XRD)和原子力显微镜(AFM)研究的结果,讨论了用超薄P3HT膜制备的器件中观察到的大接触电阻的起源。

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