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Direct Writing of Three-Dimensional Macroporous Photonic Crystals on Pressure-Responsive Shape Memory Polymers

机译:在压力响应形状记忆聚合物上直接书写三维大孔光子晶体

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摘要

Here we report a single-step direct writing technology for making three-dimensional (3D) macroporous photonic crystal patterns on a new type of pressure-responsive shape memory polymer (SMP). This approach integrates two disparate fields that do not typically intersect: the well-established templating nanofabrication and shape memory materials. Periodic arrays of polymer macropores templated from self-assembled colloidal crystals are squeezed into disordered arrays in an unusual shape memory "cold" programming process. The recovery of the original macroporous photonic crystal lattices can be triggered by direct writing at ambient conditions using both macroscopic and nanoscopic tools, like a pencil or a nanoindenter. Interestingly, this shape memory disorder order transition is reversible and the photonic crystal patterns can be erased and regenerated hundreds of times, promising the making of reconfigurable/rewritable nanooptical devices. Quantitative insights into the shape memory recovery of collapsed macropores induced by the lateral shear stresses in direct writing are gained through fundamental investigations on important process parameters, including the tip material, the critical pressure and writing speed for triggering the recovery of the deformed macropores, and the minimal feature size that can be directly written on the SMP membranes. Besides straightforward applications in photonic crystal devices, these smart mechanochromic SMPs that are sensitive to various mechanical stresses could render important technological applications ranging from chromogenic stress and impact sensors to rewritable high-density optical data storage media.
机译:在这里,我们报告一种单步直接写入技术,用于在新型压力响应形状记忆聚合物(SMP)上制作三维(3D)大孔光子晶体图案。这种方法整合了两个通常不相交的不同领域:完善的模板化纳米加工和形状记忆材料。从自组装胶体晶体模板化的聚合物大孔的周期性阵列以不寻常的形状记忆“冷”编程过程被挤压成无序阵列。原始的大孔光子晶体晶格的恢复可以通过使用宏观和纳米工具(例如铅笔或纳米压头)在环境条件下直接书写来触发。有趣的是,这种形状记忆无序的阶跃是可逆的,光子晶体图案可以擦除和再生数百次,从而有望制造出可重构/可重写的纳米光学器件。通过对重要工艺参数(包括尖端材料,触发变形大孔的恢复的临界压力和写入速度)进行基础研究,获得了对直接书写中由横向剪应力引起的塌陷大孔的形状记忆恢复的定量认识。可以直接写在SMP膜上的最小特征尺寸。除了在光子晶体器件中的直接应用外,这些对各种机械应力敏感的智能机械变色SMP还可提供重要的技术应用,从发色应力和冲击传感器到可重写的高密度光学数据存储介质。

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