Development of membrane probe with pyramidal tips for LSI testing

摘要

A membrane probe with pyramidal tips is developed for bare chip and wafer testing to achieve good contact properties at small probing marks on LsIs with narrow pitch. By using anisotropic etching of silicon, quadrangular pyramidal pits are formed as the cast of probe tips. By nickel plating on these pits, pyramidal tips with copper wirings are formed on the polyimide film. Afterwards, the silicon wafer cast is dissolved by etching. This membrane probe shows stable contact resistance at 0.1-0.2 Ω.