Single mask step etching of Fabry-Perot etalons for spectrally resolved imagers

摘要

Enhanced optical spectral resolution is of great interest for sensor technology applications. One-dimensional scanners are commonly used for spectral imaging, and there is increased interest in 2D spectral imagers. The latter are not easy to achieve, since single channel pixels need to be very small and creating an arbitrary filter of pixel size is not trivial. Here we present a single mask etch step using grayscale lithography enabling Fabry-Perot type filters for sub-pixel pitches smaller than 5 mu m.