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Chemical tuning of room-temperature ferrimagnetism and ferroelectricity in epsilon-Fe2O3-type multiferroic oxide thin films

机译:ePSilon-Fe2O3型多体氧化物薄膜的室温铁磁磁性和铁电的化学调整

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摘要

epsilon-Fe2O3-type iron oxide is a promising room-temperature multiferroic material. However, it is difficult to achieve the coexistence of large magnetization and reversible polarization due to large leakage current. In this study, we fabricated highly crystalline codoped epsilon-Fe2O3 films of A(0.2)Ga(0.4)Fe(1.4)O(3) (A = Al, Ga, Sc, and In) and systematically investigated the doping effects on the magnetic and ferroelectric properties. All films are pure epsilon-phase and simultaneously exhibit in-plane ferrimagnetism and out-of-plane ferroelectricity at room temperature. Unlike the epsilon-Fe2O3 film, the films do not contain secondary phases such as alpha- or gamma-phases, because the epsilon-phase is stabilized by Ga at the tetrahedral site. The Curie temperature, saturated magnetization, coercive field, and magnetic anisotropy of the films are enhanced upon decreasing the ionic radius of A, despite the same content of magnetic element (Fe3+ 3d(5)). These enhancements are derived from the increase in the amount of Fe ions at octahedral sites. Furthermore, we found that the leakage current significantly decreases with Sc doping, resulting in clear ferroelectric hysteresis loops in a wide frequency range at room temperature. Among the dopants in this study, codoping of Sc and Ga is the most promising method for obtaining a highly crystalline film with room-temperature large magnetization and reversible polarization with low leakage current.
机译:EPSILON-FE2O3型氧化铁是一个有前途的室温多体材料。然而,由于大的漏电流难以实现大的磁化和可逆极化的共存。在这项研究中,我们制造了高度结晶的Copoped Epsilon-Fe 2 O 3膜(0.2)Ga(0.4)Fe(1.4)O(3)(a = Al,Ga,Sc和In),并系统地研究了对掺杂效应磁性和铁电性能。所有薄膜均为纯ε-相,同时在室温下同时在平面内的铁成型主义和面内铁电性。与epsilon-Fe2O3膜不同,薄膜不含次生阶段,例如α-或γ-阶段,因为epsilon相通过Ga在四面体位点稳定。尽管磁性元件相同的磁性元件(Fe3 + 3D(5)),因此在减少离子半径时,厚度温度,饱和磁化,矫顽场和膜的磁各向异性增强。这些增强源自八面体位点的Fe离子量的增加。此外,我们发现漏电流随SC掺杂显着降低,导致室温下宽频率范围内的透明铁电滞后环。在该研究的掺杂剂中,SC和Ga的编码是获得高度结晶膜的最有希望的方法,具有室温大的磁化和具有低漏电流的可逆极化。

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